Bolay Bhattacharya, Debmalya Mitra, Arnab De, Partha Sarathi Roy, Amalesh Samanta

Abstract

At present resistance in bacterial environment has become a threatening global problem to us. We removed plasmid DNA for comparing drug sensitivity between plasmid containing and plasmid cured bacterial strains by isolated compound. Petroleum ether extract of the leaves of Coccinia grandis (L.) Voigt. (Family: Cucurbitaceae) was used to isolate one isoprenoid compound (Polyprenol C-60). Plasmid containing two bacterial strains of Escherichia coli (ATCC 25938) and Bacillus cereus (IMAUB1022) were cultured in nutrient broth media & drug resistance was studied using Chloramphenicol (reference drug) 1 μg/ml for Bacillus cereus (IMAUB1022) & 5μg/ml for Escherichia coli (ATCC 25938). Polyprenol C-60 was used in concentration 5 μg/ml for both Bacillus cereus (IMAUB1022) & Escherichia coli (ATCC 25938). The genes responsible for resistance to Chloramphenicol and Polyprenol C-60 are present on plasmid DNA of both Bacillus cereus (IMAUB1022) and Escherichia coli (ATCC 25938). The presence of resistance gene in mega plasmid was concluded by the result of plasmid curing. Both Polyprenol (C-60) and Chloramphenicol exhibited resistance to Bacillus cereus (IMAUB1022) and Escherichia coli (ATCC 25938) before plasmid curing & exhibited sensitivity to both after plasmid curing confirmed that the resistance is plasmid mediated.